Status note December 2022: The PLD is out-of-service at this time. Please check back for updates on its status or contact the superuser for more information.
Pulsed laser deposition (PLD) is a laser-based technique used to grow high-quality thin films of complex materials on substrates like Silicon wafers. The material to be deposited (target) is vaporized by short and intense laser pulses and forms a plasma plume. Then, the vaporized target material from the plasma bombards the substrate and creates a thin homogenous layer on this substrate. For each laser shot, a layer of only a few nanometers of material is ablated to form the plasma plume in a process that typically lasts a few tens of picoseconds. To enable this process, nanosecond pulses from a fully contained excimer laser with energies of tens to hundreds of mJ are necessary.
Capabilities
- Precise deposition of chalcogenide monolayers from bulk chalcogenide targets
- High vacuum sample chamber for high purity deposition conditions
Location
Roberts Hall 116
Primary Contact
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