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Facilities

Thermal Evaporator

This custom deposition system is a modular instrument for preparation of thin film metal-halide perovskite materials. The vacuum chamber is equipped with a Pfeiffer ACP40 backing pump and a 10″ Pfeiffer turbo pump allowing fast pump down times to a base pressure of ~1×10-5 torr. Substrates up to 12″ x 12″ can be accommodated on a linear translation rail. The vacuum chamber has numerous feedthroughs on its base and side walls that allow for installation and testing of custom deposition sources.

Capabilities
  • Resistive thermal evaporation with a Luxel RADAK II deposition source.
Location

MolES 140A-2

Primary Contact

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Molecular Engineering and Materials Center
Box 351700
Department of Chemistry
University of Washington
36 Bagley Hall
Seattle, WA 98195-1700
[email protected]
The University of Washington MRSEC is supported by the National Science Foundation under NSF Award Number DMR-2308979. Any opinions, findings, conclusions or recommendations expressed in this material are those of the PI(s) and do not necessarily reflect those of the National Science Foundation.