Skip to content

Pulsed Laser Deposition

Status note December 2022: The PLD is out-of-service at this time. Please check back for updates on its status or contact the superuser for more information.

Pulsed laser deposition (PLD) is a laser-based technique used to grow high-quality thin films of complex materials on substrates like Silicon wafers. The material to be deposited (target) is vaporized by short and intense laser pulses and forms a plasma plume. Then, the vaporized target material from the plasma bombards the substrate and creates a thin homogenous layer on this substrate. For each laser shot, a layer of only a few nanometers of material is ablated to form the plasma plume in a process that typically lasts a few tens of picoseconds. To enable this process, nanosecond pulses from a fully contained excimer laser with energies of tens to hundreds of mJ are necessary.

  • Precise deposition of chalcogenide monolayers from bulk chalcogenide targets
  • High vacuum sample chamber for high purity deposition conditions

Roberts Hall 116

Primary Contact

Click here to view the facility contacts.