This custom deposition system is a modular instrument for preparation of thin film metal-halide perovskite materials. The vacuum chamber is equipped with a Pfeiffer ACP40 backing pump and a 10″ Pfeiffer turbo pump allowing fast pump down times to a base pressure of ~1×10-5 torr. Substrates up to 12″ x 12″ can be accommodated on a linear translation rail. The vacuum chamber has numerous feedthroughs on its base and side walls that allow for installation and testing of custom deposition sources.
- Resistive thermal evaporation with a Luxel RADAK II deposition source.
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